Developments in Applied Spectroscopy: Selected papers from by Frank L. Chan (auth.), E. L. Grove, Alfred J. Perkins (eds.)
By Frank L. Chan (auth.), E. L. Grove, Alfred J. Perkins (eds.)
Volume 7 of advancements in utilized Spectroscopy is a suite of forty-two papers chosen from those who have been provided on the seventh nationwide assembly of the Society of utilized Spectroscopy, held (in position of the nineteenth Mid-America Symposium on Spectroscopy) in Chicago, may possibly 13-17, 1968. those papers, chosen by way of the editors and reviewed via people an expert within the box, are these of the symposium sort and never these bearing on particular learn themes that one might count on to be submitted to a magazine. it's the opinion of the committee that this kind of e-book has a big position within the literature. The fairly huge variety of papers could bring about relatively a large quantity if certain in a single set of covers. hence, and to provide the cloth in parts of extra particular mterest, quantity 7 was once divided into elements, half A, Physical-Inorganic, and half B, Physical-Organic advancements. The seventh nationwide assembly used to be subsidized by means of the Chicago part as host in cooperation with the St. Louis, New England, Penn York, Niagara-Frontier, Cincinnati, Ohio Valley, long island, Baltimore-Washington, North Texas, Rocky Mountain, and Southeastern Sections of the Society for utilized Spectroscopy and the Chicago gasoline Chromatography workforce. The editors desire to exhibit their appreciation to the authors and to people who helped with the reviewing. The latter comprise Dr. Elma Lanterman, Mr. John E. Forrette, Dr. Carl Moore, Dr. B. Jaselskis, Mr. H. G. Zelinski, Mr.
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Extra info for Developments in Applied Spectroscopy: Selected papers from the Seventh National Meeting of the Society for Applied Spectroscopy (Nineteenth Annual Mid-America Spectroscopy Symposium) Held in Chicago, Illinois, May 13–17, 1968
Fay, and W. M. Mueller, eds. Plenum Press, New York (1966), pp. 515-527. 14. Frank 1. Chan and James T. Carpenter, Solid Solutions of Cadmium SulfideCadmium Selenide Films, Advances in X-Ray Analysis, Vol. 12, C. S. Barrett, 1. B. Newkirk, and G. R. , Plenum Press, New York. (1969), pp. 581-600. 15. G. E. F. Lundell, H. A. Bright, and J. I. Hoffman, Applied Inorganic Analysis, John Wiley and Sons, New York (1953). 16. Frank 1. Chan, A Study of X-Ray Fluorescence Method with Vacuum and Air-Path Spectrographs for the Determination of Film Thickness of II-VI Compounds, Advances in X-Ray Analysis, Vol.
Wafer, assembled from sections each of which was taken in more or less exact diffraction position. At this magnification it is difficult to evaluate the quality of a wafer unless it is severely deformed. Figure 17 shows a wafer after the n- Fig. 16. Berg- Barrett (220) skew-retlection topograph of an nip diffused silicon wafer of avalanche diodes with guard-ring structures. Made of four stationary section topographs. Device dimension, 6 X 10 mils. CHARACfERIZATION OF SEMICONDUCfOR SURFACE LAYERS 49 Fig.
To use Cr Ka radiation and the (220) reflection to examine (111) silicon, we are limited to very shallow penetration. As a matter of fact, other radiation will not produce useful (220) reflections either. Therefore the application of the zero-layer reflection topograph, although useful, is quite limited for (Ill) silicon. Consequently, skew reflections in which the normal to the specimen surface and the incident and reflected beam vectors are not coplanar have been used to study defects in (Ill) silicon surface layers using a Cu Ka radiation.